Imaging Process - Antifoam Products
ANTIFOAM BB
- Highly concentrated formula for use with photoresist strippers, photoresist developers and LPI developers.
ANTIFOAM DES
- Concentrated, water-miscible antifoam for use in developers and resist strippers.
Highly effective in both alkaline and acid solutions.
AF-1104
- A blended organic defoaming surfactant for use in reducing foam generated in spray equipment.
AF-1104 is especially effective in solutions used for developing and stripping aqueous and semi-aqueous dry film photoresists.
Effective at low temperatures of 80°~130° F.
ANTIFOAM AR-301 LF
- A blended non-silicone organic defoamer for use in reducing foam generated in spray equipment.
ANTIFOAM AR-301 LF is especially effective in solutions used for developing and stripping aqueous and semi-aqueous dry film photoresists. Effective at low temperatures of 80°-130° F.
ANTIFOAM LC
- An economical, blended non-silicone antifoaming agent.
ANTIFOAM LC is especially effective in alkaline solutions used for developing and stripping aqueous photoresists.
It quickly knocks down foam and disperses well in water.
ANTIFOAM LC is effective at very low concentrations and over a wide temperature range.