X-SiH₄



Application Field

- Ion Implant Process, Ashing and Etching Process, Epi Process, Some Chemical Vapor Deposition(CVD) Process, For reducing of SiH4 gas, etc.


● Characteristic

▶ Appearance & Size : Pellet (ø=3.0, more)
▶ Color : Purple
▶ Bulk density : 0.70~0.75g/cc
▶ Crush strength : > 2.0kgf/㎠
▶ Upper temp. limit : < 100℃


● Appearance




● Reaction Mechanism

Gas

Mechanism

TLV (ppm)

SiH4

SiH4 + 2MOH → M2Si + 2H2O + H2

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