X-SiH₄
● Application Field
- Ion Implant Process, Ashing and Etching Process, Epi Process, Some Chemical Vapor Deposition(CVD) Process, For reducing of SiH4 gas, etc.
● Characteristic
▶ Appearance & Size : Pellet (ø=3.0, more)
▶ Color : Purple
▶ Bulk density : 0.70~0.75g/cc
▶ Crush strength : > 2.0kgf/㎠
▶ Upper temp. limit : < 100℃
● Appearance
● Reaction Mechanism
Gas | Mechanism | TLV (ppm) |
---|
SiH4 | SiH4 + 2MOH → M2Si + 2H2O + H2 | 5 |